PHOTOFAIRS open call

PHOTOFAIRS is delighted to announced applications are now open for the Exposure Award 2020.

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The Exposure Award, powered by Modern Eye, cements the fair’s role in supporting emerging and experimental galleries and artists by offering the winner a complimentary 20sqm stand at PHOTOFAIRS 2020, which takes place 18 to 20 September at Shanghai Exhibition Center. PHOTOFAIRS recognises the challenges, this year more than ever, in experimenting with ambitious and innovative artworks in a new market and the Exposure Award removes some of these financial risks to enable our galleries, our artists and our collectors to truly explore photography's potential. The Award embodies our commitment to find and present artists and galleries working at the very edge of what photography can do and is an initiative we feel is particularly relevant in the wake of COVID-19.

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Application deadline is May 22, 2020.

影像上海艺术博览会很高兴宣布，第二届“曝光奖”现已正式启动，该奖项由Modern Eye独家提供支持，获奖方案将在博览会现场获得一个20平米的展位。博览会充分理解画廊在新市场推出具有突破性和创新性作品所面临的困难与挑战，尤其是在疫情席卷全球的当下。为了鼓励新兴与试验性画廊，我们希望“曝光奖”的设立，能够更好地帮助这部分画廊移除经济上的风险，以确保艺术家、收藏家及观众能真正探索并发现摄影所能。第七届影像上海艺术博览会，将于2020年9月18-20日重回上海展览中心，“曝光奖”申请时间为即日起至5月22日。

The jury for this year's Exposure Award comprises four leading voices in the photography industry. Participating on this year’s judging panel is (from left to right) Cao Dan, President of MODERN ART & Publisher of The Art Newspaper China & LEAP; Sunyoung Kim, curator of The Museum of Photography, Seoul, South Korea; Lu Ni, Executive Director, Xie Zilong Photography Museum (XPM) & Secretary General, Alliance of Chinese Photography Museums; and Gwen Lee, Co-founder + Director, Singapore Photography Festival & Director, DECK, Singapore. During the application opening, we'll be interviewing each judge to discover more about their expertise and thoughts on what makes a strong submission. Each interview will be published on the news section of our website.

今年“曝光奖”评审委员会将由四位影像艺术行业内的领军人物组成，她们（从左至右）分别为：曹丹（现代传播集团文化艺术平台Modern Art总裁，兼《艺 术新闻/中文版》及《艺术界》出版人）；金善英（SUNYOUNG KIM，首尔摄影博物馆策展人）；卢妮（谢子龙摄影博物馆执行馆长，中国影像艺术机构联盟秘书长）；李锦丽（GWEN LEE，新加坡国际摄影节总监兼联合创始人）。在申请截止之前，我们将每周与评委对话，聆听她们对奖项的期待，并邀请她们为参与者提供有效的建议。您可以在影像艺术博览会官网的“新闻”版块阅读评委采访。

PHOTOFAIRS is dedicated to presenting fine art photography and moving image from leading international galleries and their artists in dynamic and cutting-edge destinations around the world.

In its highly curated approach, PHOTOFAIRS provides an elegant and vibrant environment for both seasoned and new collectors. In addition, tailored VIP and public programs are designed to create an engaging platform for our international audience.

PHOTOFAIRS will return to Shanghai its seventh edition, September 18-20, 2020 at the Shanghai Exhibition Center.

PHOTOFAIRS is a joint venture between Angus Montgomery Arts and the World Photography Organisation and is part of a wider network of leading contemporary art fairs including Taipei Dangdai, Sydney Contemporary, India Art Fair, Art Central Hong Kong and Art SG.

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